Analytical Threshold Voltage Model Considering Quantum Size Effects for Nanocrystalline Silicon Thin Film Transistors
R. Remmouchea,b, R. Fatesa,b and H. Bouridaha,b
aDepartment of Electronics, Jijel University, B.P. 98, Ouled Aissa, Jijel 18000, Algeria
bLEM Laboratory, Jijel University, B.P. 98, Ouled Aissa, Jijel 18000, Algeria
Received: April 28, 2016; In final form: September 19, 2017
Full Text PDF
This paper presents an analytical model calculating the threshold voltage in nanocrystalline silicon (nc-Si) thin film transistors by considering a granular morphology of silicon nanocrystallites forming the channel and using the two-dimensional the Poisson equation. The numerical calculations demonstrate that, according to the quantum size effects on both dielectric constant and band gap, the threshold voltage values are strongly related to the silicon crystallites structure. To justify the validity of our model suitable for implementation in circuit simulators such as SPICE, the simulation results obtained are compared with the available research data and they shows a satisfactory match, thus, demonstrating the validity of our model.

DOI: 10.12693/APhysPolA.132.1230
PACS numbers: 68.55.J-, 73.20.At, 73.40.Ty, 73.63.Bd