Electrical Resistivity of the Monoatomic Metallic Layer |
| A. Paja and A. Działo
AGH University of Science and Technology, Faculty of Physics and Applied Computer Science, Department of Solid State Physics, al. A. Mickiewicza 30, 30-059 Krakow, Poland |
| Received: December 31, 2012; in final form: March 8, 2013 |
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| We present new formula which describes the change of electrical resistivity of a monoatomic metallic layer with temperature. The results are compared with those given by the Bloch-Grüneisen formula for bulk metals. Our calculated values compared with those for bulk materials are significantly higher at low temperatures (T<0.1θ) and apparently lower at the remaining range of temperatures. Both effects can be explained by the low dimensionality of the sample. |
DOI: 10.12693/APhysPolA.123.770 PACS numbers: 73.50.-h, 73.50.Bk, 73.63.-b, 73.63.Hs |