Magnetron Sputtered SnOx Films on Tin Probed by Slow Positron Implantation Spectroscopy
N. Nancheva, P. Docheva
Department of Physics, Technical University, Rousse 7017, Bulgaria
W. Anwand, G. Brauer
Institut fur Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf Postfach 510119, 01314 Dresden, Germany
and P.G. Coleman
School of Physics, University of East Anglia, Norwich NR4 7TJ, UK
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SnOx films grown on tin substrates via d.c. magnetron sputtering at different bias were studied by slow positron implantation spectroscopy. The change of substrate bias from -40 V to -140 V and its influence on the films is shown and discussed.
DOI: 10.12693/APhysPolA.95.623
PACS numbers: 78.70.-g