Resonant Tunnelling in Double-Barrier Heterostructures with an Accumulation Layer
T. Wosiński, T. Figielski, A. Mąkosa, S. Wrotek and W. Dobrowolski
Institute of Physics, Polish Academy of Sciences and College of Science, Al. Lotników 32/46, 02-668 Warszawa, Poland
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Two modes of electron gas injection in resonant tunnelling through GaAs/AlGaAs double-barrier heterostructures were revealed while studying their current-voltage characteristics. Examining peculiarities of the characteristics within the temperature range 4-350 K and under a high magnetic field, we were able to distinguish the contribution to resonant tunnelling of ballistic electrons injected from a three-dimensional electron gas in the emitter contact and that of electrons injected from a two-dimensional electron gas in the accumulation layer formed near the emitter barrier.
DOI: 10.12693/APhysPolA.94.617
PACS numbers: 73.40.Gk, 73.50.Jt, 85.30.Mn