Photoinduced Defects Creation on Sulfur Passivated Surface of GaAs
Z.R. Żytkiewicza,b, L. Dobaczewskib, D. Gomeza and F. Brionesa
aInstituto de Microelectronica de Madrid, Isaac Newton 8, 28760 Tres Cantos, Madrid, Spain
bInstitute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland
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We report on photoinduced defect creation on the sulfurized (100) GaAs surface. The process manifests itself by unrecoverable temporal decrease in the photoluminescence intensity of the GaAs surface treated by (NH4)2Sx solution. The results are discussed in terms of a photoinduced process of the AsGa antisite generation on the sulfurized surface of GaAs.
DOI: 10.12693/APhysPolA.92.1083
PACS numbers: 68.35.Dv, 68.45.Da