Photoelectron Emission Microscopy and its Application to the Study of Polymer Surfaces |
| A. Cossy-Favre, J. Diaz, S. Anders, H. Padmore Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA Y. Liu, M. Samant, J. Stöhr, H. Brown and T.P. Russell IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA |
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| The X-ray photoelectron emission microscopy at the Advanced Light Source has a spatial resolution of 0.2 microns at an accelerating voltage of 12 kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 Å showed protrusions of 2-3 μm diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 Å thick films showed 5-6 μm segregated regions without any topological structure. |
| DOI: 10.12693/APhysPolA.91.923 PACS numbers: 61.16.Ms, 73.61.Ph, 64.75.+g |