Tunnel Current Features Caused by Defect Assisted Process in Resonant-Tunnelling Structures
A.E. Belyaev, S.A. Vitusevich, B.A. Glavin, R.V. Konakova
Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Kiev 252028, Ukraine

W. Dobrowolski, A. Mąkosa
Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warszawa, Poland

L.N. Kravchenko and E.S. Gornev
Science and Research Institute of Molecular Electronics, Zelenograd, Moscow district, Russia
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An extra channel of electron tunnelling through a double-barrier resonant-tunnelling GaAs/AlGaAs heterostructure caused by impurity assisted tunnelling was identified. We argue that it is due to DX centres associated with dopant donor atoms which diffused into the AlGaAs barrier layer.
DOI: 10.12693/APhysPolA.90.727
PACS numbers: 73.40.Gk, 85.30.Mn