Influence of Oxygen Impurities on Electrical Properties of Fullerene C60
T. Rabenau, S. Roth and R.K. Kremer
Max-Planck-Institut f. Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany
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We present high temperature dc, ac and contactless microwave conduc­tivity results on solid-state C60 (films and crystals) from room temperature up to 850 K. Heating pristine samples, which were exposed to the ambi­ent atmosphere, under dynamic vacuum at first leads to a reduction of the electrical resistance and finally, above ≈700 K, to an increase in the re­sistance. The decrease is ascribed to oxygen desorption and the increase to the chemical reactivity of residual chemisorbed oxygen with the C60 host molecules, respectively. Samples, annealed above 800 K, display a reversible temperature dependence of the resistance. The high temperature regime of their resistance exhibits an activated behaviour with an universal activation energy of 2Ea = 1.85 ± 0.04 eV for crystals and films, which is identical to the HOMO-LUMO splitting of the C60-molecules.
DOI: 10.12693/APhysPolA.87.881
PACS numbers: 72.20.-i, 72.20.Jv, 72.80.Le