Diffusion of Potassium on Nickel |
| M. Błaszczyszynowa and R. Błaszczyszyn Institute of Experimental Physics, University of Wrocław, Cybulskiego 36, 50-205 Wrocław, Poland |
| Received: June 24, 1991; in revised form September 9, 1991 |
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| The surface diffusion of a potassium dose corresponding to the average coverage Θ̅K = 1.5 on nickel was studied using the field emission technique in the temperature range of 78-133 K. In general, under such conditions diffusion proceeds with the sharp moving boundary and the activation energy Q from 0.16 eV to 0.36 eV dependently on the crystallographic directions. Free boundary migration with the energy Q < 0.16 eV is expected on the close-packed regions {111} and {001} already at liquid N2 temperature. The results are discussed in relation to the atomic structure of the nickel substrate taking into account the interaction in the adsorption layer. |
| DOI: 10.12693/APhysPolA.81.285 PACS numbers: 68.35.Fx, 79.70.+g, 79.90.+b |