Synergetic Effect of Aluminum and Fluorine Simultaneously Doped Zinc Oxide Thin Films Deposited by Simplified Spray Pyrolysis Technique

H. Sonia Juditha, R. Ashok Kumara, A. Panneerselvamb, K. Saravanakumarc aPG and Research Department of Physics, Thiruvalluvar Government Arts College, Rasipuram, Namakkal, 637 401 Tamil Nadu, India bDepartment of Physics, Vivekanandha College of Engineering for Women (Autonomous), Elayampalayam, Tiruchengode, Namakkal, 637 205 Tamil Nadu, India cDepartment of Physics, Mahendra Institute of Technology (Autonomous), Mallasamudram, Namakkal, 637 503 Tamil Nadu, India

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The aim of the present investigation is to fabricate pure and aluminum (Al) + fluorine (F) simultaneously doped zinc oxide films using a cost-effective simplified spray pyrolysis technique with a perfume atomizer for the first time. The results report the effects of [Al+F] doping on the structural, optical, electrical, and surface morphological properties of ZnO thin films. The crystalline structure studies reveal the hexagonal wurtzite structure of the ZnO thin films. X-ray diffraction patterns show that the crystallite size decreases from 71.20 to 41.36 nm. Optical studies reveal an average transmittance of 90 at.% in the visible region. The blue shift is observed in the absorption edge, and the band gap value significantly varies from Eg=3.25 eV to Eg=3.38 eV. Electrical studies indicate that the minimum sheet resistance of 58.75 Ω-1 is achieved for 3+10 at.% of [Al+F] doping. The highest figure of merit is estimated to be approximately 8.441×10-3 Ω-1. Scanning electron microscope results show a spherical-shaped, pinhole morphology. These findings suggest that the described conditions are very suitable for optoelectronic applications.

DOI:10.12693/APhysPolA.147.55 topics: zinc oxide, optical, electrical, thin films