Application of X-rays to Interpret Intensity Ratios for Nickel in Nickel (II) Oxide |
| O.K. Köksala, b, Ö. Söğütc, E. Küçükönderd, S. Dağlie
aAdıyaman University, Faculty of Engineering, Department of Electrical and Electronics Engineering, 02040, Adıyaman, Türkiye bKaradeniz Technical University, Faculty of Science, Department of Physics, 61080, Trabzon, Türkiye cKahramanmaraş Sutcu Imam University, Faculty of Science and Letters, Department of Physics, 46100, Kahramanmaraş, Türkiye dKahramanmaraş Sütçü İmam University, Vocational School of Technical Sciences, Department of Materials and Materials Processing Technologies, 46100, Kahramanmaş, Türkiye eİbni Sina Vocational Technical and Anatolian High School, 01250, Sarıçam, Adana, Türkiye |
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| The K-shell characteristic X-ray intensity ratios of nickel (II) oxide thin films generated by chemical spraying with 1-6 percent boron doping were studied. An americium-241 radioisotope source generated 59.543 kilo-electron volt gamma rays at 50 mili Curie intensity for these samples. The distinctive X-rays of the samples were %counted calculated using a Canberra ultra-low energy germanium detector (with a resolution of 150 electron volts at 5.96 keV). The results were interpreted based on the amount of boron doped in nickel (II) oxide thin films, and it was discovered that, with the exception of boron doping quantities of 5 percent and 6 percent, K-shell X-ray intensity ratios rose as boron doping amounts increased. The findings are given and compared to those of the previous study. The obtained results are provided and compared in the table to the other researchers' theoretical and experimental results. |
DOI:10.12693/APhysPolA.143.362 topics: NiO, boron, K-shell intensity ratio, thin film |