Effect of Oxygen Flow Rate on PECVD Prepared ZnO Thin Films Physical Properties: Experiments Associated with DFT Calculations
S. Hairechea, b, M. Bouchenafac, d, M.A. Fadlae, A. Benmakhlouff, S. Maabedc, M. Sidoumoud
aLaboratory of Physics of Experimental Techniques and Applications, University of Medea, Medea 26000, Algeria
bLASICOM Laboratory, Faculty of Sciences, University of Blida 1, Blida 09000, Algeria
cDepartment of Material Sciences, Faculty of Science, Amar Telidji University, BP 37G, Laghouat, 03000, Algeria
dTheoretical Physics and Radiation Matter Interaction Laboratory (LPTHIRM), University of Blida 1, 09000, Algeria
eLaboratoire de physique des matériaux, Université Amar Telidji de Laghouat, BP 37G Laghouat 03000, Algeria
fLaboratoire de Caractérisation et Valorisation des Ressources Naturelles, Université de Bordj Bou Arreridj, 34000, Algeria
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In this paper, we report on the deposition of zinc oxide thin films by the plasma enhanced chemical vapor deposition technique. The effects of oxygen flow rate on surface morphology, optic transmission, and gap energy are studied. The X-ray diffraction technique shows polycrystalline phases in the deposited material, the crystal structure is hexagonal, and the preferential orientation of crystal growth is in the (101) direction. The best optical transmission of zinc oxide is of the order of ~89%, and a wide optical gap of ~3.7 eV. To make a comparison with the present results and theoretical data, an ab initio calculation is carried out by the density functional theory method. To study the oxygen vacancies concentration effect on bandgap and optical transmission, we use three different configurations, namely ZnO0.97, ZnO0.94, and ZnO0.91. To confirm our experimental and calculated results, we compared them to those given in the literature.

DOI:10.12693/APhysPolA.142.216
topics: zinc oxide, oxygen vacancies, PECVD, DFT