Effect of Stirring on Chemically Deposited ZnO Thin Films

M. Önal, B. Altıokka Bilecik Şeyh Edebali University, Bilecik 11210, Turkey

Received: January 29, 2020; in final form March 20, 2020

Full Text PDF

In this study, the effects of stirring rate were investigated while ZnO thin films were produced by the chemical bath deposition method. Five different samples were produced by mixing the prepared solution at 0, 300, 600, 900, and 1200 rpm cycles. Scanning electron microscope showed that ZnO nanorods were formed very rarely when the solution was not stirred and that the nanorods became more frequent as the stirring rate increased. X-ray diffraction results showed that all films formed hexagonal wurtzite structure and peak intensities were compatible with the ASTM card. According to the absorbance measurements, the energy band gaps of the samples were between 3.02 eV and 3.97 eV. When the visualization of the obtained films was examined, it was observed that as the stirring rate increased, ZnO adhered well on the glass substrates. It was observed that the film adhering on the glass substrate at 0 rpm was very weak, whereas the film adhered very well on the glass surface as the solution stirring rate increased.

DOI:10.12693/APhysPolA.137.1209 topics: ZnO, chemical bath deposition, stirring rate, thin film\\vs*{10pt}