Investigations of a-Si1-xCx Thin Films as a Catalyst for CO2 Photoelectrochemical Reduction

S. Kaci, M. Ouadfel, Y. Ouadah, L. Talbi, A. Boukezzata, K. Benfadel, I. Bozetine, A. Keffous, S. Achacha, A. Manseri, C. Yaddaden, S. Belaid, S. Belhousse Research Center on Semiconductor Technology for Energetic, CMSI Division, CRTSE, 2 Bd. Frantz Fanon, PB 140, 7M, Algiers, Algeria

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In this work we investigated the catalytic property of amorphous silicon carbide (a-SiC) and SiC loaded copper (Cu-SiC) thin films as photocathodes for the photoelectrochemical reduction of CO2. The formers (a-SiC) were elaborated by magnetron sputtering method on both p-type silicon (p-Si) and glass substrates. The Cu-surface modification of a-SiC (Cu-SiC) thin films were well carried out by Cu particles deposited by evaporation method on the surface of the SiC thin films. The catalytic activity was studied for both simple a-SiC and Cu-surface modified SiC thin films. The results showed that the Cu-modified a-SiC speeds up the photocatalytic activity compared to the unmodified a-SiC. The conduction band is suitably positioned with respect to the CH3OH/CO2 leading to a good reduction of CO2 using visible irradiation.

DOI:10.12693/APhysPolA.137.523 topics: a-Si1-xCx, thin film, CO2 reduction, photoelectrochemical process