Design and Fabrication of Multi-Layers Infrared Antireflection Nanostructure on ZnS Substrate |
| M. Gholampoura, b, A. Miric, S.I. Karaniana, A. Mohammadid
aPhysics Group, Faculty of Basic Sciences, Imam Ali University, Tehran, Iran bNanomaterials Group, Department of Materials Engineering, Tarbiat Modares University, P.O. Box 14115-143, Tehran, Iran cThin Film Lab., Faculty of Physics, Semnan University, Semnan, Iran dDepartment of management, faculty of management science, Imam Ali University, Tehran, Iran |
| Received: June 16, 2019; revised version August 18, 2019; in final form August 23, 2019 |
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| MgF2/ZnS thin films were deposited on ZnS substrates by physical vapor deposition (PVD) to investigate multi-layer antireflection (AR) coatings. The three-layers of MgF2/ZnS/MgF2 with optimized thicknesses were fabricated by PVD technique and studied by Fourier-transform infrared spectroscopy (FTIR), X-ray diffraction (XRD), and field emission scanning electron microscope (FESEM). From FTIR spectroscopy it was found that in the wavelength range of 8-12 μm, the average transmittance of the double-side coated sample increases by about 26% and its maximum reaches about 98%. The FESEM figures indicate that all the samples were uniform, compact with good adhesion on ZnS substrate. The XRD pattern of the ZnS/MgF2 multilayer which exhibits the presence of both pristine phases of MgF2 and ZnS, respectively. |
DOI:10.12693/APhysPolA.136.527 topics: antireflection coatings, physical vapor deposition, ZnS substrate, FTIR spectroscopy, XRD |