Microwave Conductivity Investigations of AZO Films Deposited by Atomic Layer Deposition Method at a Low Temperature
R. Pietruszkaa, M. Łukasiewicza, A. Wittlina, b, M. Jaworskia, M. Godlewskia
aInstitute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668 Warsaw, Poland
bCardinal Stefan Wyszyński University in Warsaw, Dewajtis 5, 01-815 Warsaw, Poland
Received: July 31, 2018
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AZO (ZnO:Al) are deposited by atomic layer deposition method for applications as transparent conductive oxide films (transparent electrode) in photovoltaics. In the present work we evaluate uniformity of such films when deposited on polymer substrate at low temperature. The latter is important for new generations of photovoltaics devices based on temperature sensitive organic materials. Results of DC and AC conductivity measurements are compared to evaluate uniformity of Al distribution in AZO films.

PACS numbers: 72.80.Ey, 73.61.Ga, 74.25.fc