Thermal Penetration of Gold Nanoparticles into Silicon Dioxide
I. Ilkiva, K. Kotlyar a, D. Amel'chuk b, S. Lebedev b, G. Cirlina,c,d,e and A. Bouravleuva,b,d
aSt. Petersburg Academic University, Khlopina Str. 8/3, 194021 St. Petersburg, Russia
bIoffe Physicotechnical Institute, Politekhnicheskaya Str. 26, 194021 St. Petersburg, Russia
cITMO University, Kronverkskiy Pr. 49, 197101 St. Petersburg, Russia
dInstitute for Analytical Instrumentation, RAS, Rizhsky Str. 26, 190103 St. Petersburg, Russia
ePeter the Great St. Petersburg Polytechnic University, Polytechnicheskaya Str. 29, 195251 St. Petersburg, Russia
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We report on an experimental study of the thermal annealing processes under air and nitrogen atmospheres of colloidal Au nanoparticles deposited onto SiO2/Si(100) samples. It was shown that Au nanoparticles during annealing under ambient conditions could penetrate inside silicon dioxide layers forming pores at that their lengths were found to be dependent on the annealing time. The influence of oxygen on the penetration process is discussed. At the same time, the annealing of Au nanoparticles under nitrogen conditions did not result in the formation of pores.

DOI: 10.12693/APhysPolA.132.366
PACS numbers: 62.23.Pq, 61.46.Df, 68.08.Bc