Production of Molybdenum and Tantalum Ion Beams using CCl2F2
M. Tureka, A. Droździel a, K. Pyszniak a, J. Filiks a, S. Prucnal a, D. Mączka a, Yu. Vaganov b and P. Węgierek c
aInstitute of Physics, Maria Curie-Skłodowska University, Pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland
bLaboratory of Nuclear Problems, JINR Dubna, Russia
cLublin University of Technology, Nadbystrzycka 38A, 20-618 Lublin, Poland
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A new method of refractory metal (like Mo and Ta) ion beam production using the arc discharge ion source and CCl2F2 (dichlorodifluoromethane) used as a feeding gas supported into the discharge chamber is presented. It is based on etching of the refractory metal parts (e.g. anode or a dedicated tube) Cl and F containing plasma. The results of measurements of the dependences of ion currents on the working parameters like discharge and filament currents as well as on the magnetic field flux density of an external electromagnet coil are shown and discussed. The separated Mo+ and Ta+ beam currents of approximately 22 μA and 2 μA, respectively, were obtained.

DOI: 10.12693/APhysPolA.132.283
PACS numbers: 07.77.Ka, 34.80.Dp, 61.72.uj