Microstructure Development in Multilayer TiBx/TiSiyCz Coatings during Post-Deposition Heat Treatment
A. Twardowska a, B. Rajchel b, J. Morgiel c and M. Mędala-Wójcik a
aInstitute of Technology, Pedagogical University, Podchorazych 2, 30-084 Krakow, Poland
bThe Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, E. Radzikowskiego 152, 31-342 Krakow, Poland
cInstitute of Metallurgy and Materials Science, Polish Academy of Sciences, W. Reymonta 25, 30-059 Krakow, Poland
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Multilayer amorphous TiBx/TiSiyCz coatings were formed by duplex treatment: dual beam ion beam assisted deposition and pulsed laser deposition. Post-deposition heating was applied to activate crystallization in the coating. In situ transmission electron microscopy heating experiments were conducted in the temperature range 20-600°C. Crystallization of TiB2 phase in TiBx layers begun at 450°C, while TiSiyCz layers retained nearly amorphous up to 600°C.

DOI: 10.12693/APhysPolA.130.1124
PACS numbers: 81.15.Cd, 81.20.-n, 42.62.-b, 61.43.Dq, 68.37.-d, 68.37.Lp, 68.65.Ac, 64.70.Kb