Nanoscopic Investigation of Magnetic Thin Films by Means of Magnetic Force Microscopy Technique |
| A. Sikora a, M. Ozimeka,b and W. Wilczyński c
aElectrotechnical Institute Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 55-369 Wrocław, Poland bInternational Laboratory of High Magnetic Fields and Low Temperatures, Gajowicka 95, 52-421 Wrocław, Poland cElectrotechnical Institute, M. Pożaryskiego 28, 04-703 Warszawa, Poland |
| Received: August 7, 2015; In final form: February 29, 2016 |
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| In the article the results of the research aimed at the recognition of the correlation between the Ni-Fe film thickness and its magnetic domain structures are described. Magnetic thin films were prepared by pulse magnetron sputtering. Obtained thin film thicknesses were in the range of 47.6-326.0 nm. Magnetic domain structures were imaged using magnetic force microscopy. In order to obtain quantitative description of magnetic domains images, the algorithms designed for topography parameters determination were applied, enabling the comparison of specific factors related to the magnetic properties of the samples. Utilized approach provided the analysis of the impact of sputtering parameters on the morphological and magnetic properties of obtained films. |
DOI: 10.12693/APhysPolA.129.1226 PACS numbers: 81.15.Cd, 68.37.Rt, 75.70.Kw |