The Influence of Cycle Sputtering Deposition on the Properties of Cu2ZnSnS4 Thin Films
Y.M. Suna,b,c, B. Yaoa,b, D. Long c, X.C. Meng c, L.H. Liu c and Z. Hua c
aState Key Lab of Superhard Material and College of Physics, Jilin University, Changchun 130023, P.R. China
bKey Laboratory of Physics and Technology for Advanced Batteries of Ministry of Education, College of Physics, Jilin University, Changchun, 130012, China
cKey Laboratory of Functional Materials Physics and Chemistry of the Ministry of Education, Jilin Normal University, Siping 136000, P.R. China
Received: March 27, 2015; In final form: May 6, 2016
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Three kinds of precursor thin films with stacking orders of Cu/Sn/ZnS, Cu/Sn/ZnS/Cu/Sn/ZnS and Cu/Sn/ZnS/Cu/Sn/ZnS/Cu/Sn/ZnS were prepared by magnetron sputtering and annealed with sulfur powder. The microstructure, morphology and optical properties of thin films were investigated by X-ray diffraction, the Raman scattering, scanning electron microscopy and UV-visible spectrophotometer. The increase of cycle number decreases the sulfurizing temperature of the formation of Cu2ZnSnS4 phase. Chemical composition can be controlled by cycle sputtering deposition. After sulfurizing at 500°C, the particle size and the band gap increase with increasing cycle number.

DOI: 10.12693/APhysPolA.129.1169
PACS numbers: 78.40.Fy