Composition and Microstructure of Surface Layers Produced by Ion Beam Assisted Deposition of Metals from a Pulsed Arc-Discharge Plasma onto Aluminum Substrates
V.V. Poplavskya, F.F. Komarov b, V.G. Luhin a, V.V. Pil'ko b and J. Partyka c
aBelarusian State University of Technology, 13a, Sverdlov Str., 220006 Minsk, Belarus
bBelarusian State University, 4, Nezavisimosti av., 220030 Minsk, Belarus
cLublin University of Technology, Nadbystrzycka 38a, 20-618 Lublin, Poland
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Ion beam assisted deposition of alloying metals (Zn, Cd, Zr, Cr) onto pure aluminum and aluminum alloy substrates from the plasma of a pulsed arc discharge for the purpose of materials corrosion stability was carried out. The Rutherford backscattering spectrometry, electron backscatter diffraction, scanning electron microscopy, and electron probe microanalysis methods were applied to investigate composition and microstructure of the prepared layers. It was found that the obtained layers are characterized by amorphous atomic structure and contain the atoms of deposited metal, substrate material components, as well as impurities of oxygen and carbon; Their thickness was measured to be ≈ 30-100 nm.

DOI: 10.12693/APhysPolA.128.946
PACS numbers: 68.37.Hk, 68.55.Nq