Structure and Some Physical Properties of Chemically Deposited Nickel Sulfide Thin Films |
| A.H. Hammad, Z.S. ElMandouh, H.A. Elmeleegi
Electron Microscope and Thin Films Department, Physics Division, National Research Centre, Dokki, 12311, Cairo, Egypt |
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| Ni2S2-x thin films with x=0, 0.5, and 1 were prepared by chemical bath deposition technique. Amorphous structure was discovered by XRD for x=1, while α-Ni7S6 and NiS phases were discovered for x=0, and x=0.5 respectively. SEM graphs of the studied films have confirmed the XRD results. Optical band gap values increase from 0.845 to 0.912 eV, with increase of the composition x from 0 to 1. Activation energy values increase in the range from x=0 to x=0.5 and does not change for x=1. |
DOI: 10.12693/APhysPolA.127.901 PACS numbers: 61.05.cp, 68.37.Hk, 68.55.jd, 68.55.J-, 78.20.Ci, 78.68.+m, 73.50.Lw, 73.90.+f |