Temperature Dependence of Ag Film Roughening during Deposition on Quasicrystal and Approximant Surfaces

B. Ünala, b, J.W. Evansa, c and P.A. Thiela,b,d aThe Ames Laboratory bDepartment of Materials Science and Engineering cDepartment of Physics and Astronomy, and dDepartment of Chemistry, Iowa State University, Ames, Iowa 50011, USA

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The temperature (T) dependence of roughening as assessed by scanning tunneling microscopy is compared for growth of Ag films on an 5-fold icosahedral Al-Pd-Mn quasicrystal surface and on an ξ'-approximant. Growth on the quasicrystal corresponds to a version: of the Volmer-Weber growth, but modified by quantum size effects, and also by kinetic smoothening at low T and low coverages (θ). Growth on the approximant corresponds to a version of the Stranski-Krastanov growth modified by kinetic roughening at low T and low θ. For larger θ, i.e., for thicker films, distinct behavior is observed.

DOI: 10.12693/APhysPolA.126.608 PACS numbers: 68.55.-a, 61.44.Br, 68.37.Ef, 81.15.Aa