Influence of the Oxygen Plasma Treatment on Carbon Electrode and Capacity of Supercapacitors
Z. Kavaliauskasa, b, L. Marcinauskasa,c and V. Valinciusa
aLithuanian Energy Institute, Plasma Processing Laboratory, Breslaujos 3, LT-4440, Kaunas, Lithuania
bKaunas University of Applied Sciences, Faculty of Technology, Pramones 20, LT-50468, Kaunas, Lithuania
cKaunas University of Technology, Department of Physics, Studentu 50, LT-51368, Kaunas, Lithuania
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Amorphous carbon electrodes were deposited using atmospheric pressure plasma torch from the mixture of argon and acetylene gases on the stainless steel substrates. The ratio of Ar/C2H2 was in the range of 15-55. The deposited coatings were immersed in low pressure oxygen plasma for 1 min. Scanning electron microscopy images show that when Ar/C2H2 ratio increases from 15 to 55, the electrodes surface roughness decreases. The Raman scattering spectroscopy results indicated that the ID/IG ratio decreases from 2.04 to 1.35. It was observed that with the increase of Ar/C2H2 ratio from 15 to 55, the capacity of supercapacitor increases from 16 mF to 36 mF. The electric capacity of capacitors has increased up to 7 times after their exposure in oxygen plasma.

DOI: 10.12693/APhysPolA.125.1316
PACS numbers: 81.15.-z, 81.05.U-, 68.55.J-