X-Ray Photoelectron Spectroscopy - Methodology and Application
E. Papis-Polakowskaa, R.G. Whiteb, C. Deeksb, M. Mannsbergerb, A. Krajewskac, W. Strupinskic, T. Płocinskid and O. Jankowskae
aInstitute of Electron Technology, al. Lotników 32/46, 02-668 Warszawa, Poland
bThermo Fisher Scientific, 81 Wyman St., Waltham (MA) 02454 USA
cInstitute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warszawa, Poland
dWarszawa University of Technology, Faculty of Materials Science and Engineering, Wołoska 141, 02-507 Warszawa, Poland
eCOMEF, Gdańska 2, 40-719 Katowice, Poland
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The crucial measurements aspects of X-ray photoelectron spectroscopy, such as chemical state analysis, depth profiling, mapping, and thickness calculation have been presented. The metal alloys, Ti2O5, graphene and type-II InAs/GaSb superlattice structures have been examined by using the new Thermo Scientific K-Alpha X-ray Photoelectron Spectrometer.

DOI: 10.12693/APhysPolA.125.1061
PACS numbers: 79.60.-i, 81.05.ue, 68.47.Gh, 68.35.bg, 68.35.bj