Effect of Cu Negative Ion Implantation on Physical Properties of Zn1-xMnxTe Films |
| A.D. Pogrebnjaka, A.P. Shypylenkoa, H. Amekurab, Y. Takedab, A.S. Opanasyuka, D.I. Kurbatova, I.A. Kolotovaa, O.V. Klymova and C. Kozakc
aSumy State University, 2 Rimsky-Korsakov Str., 40007, Sumy, Ukraine bNational Institute for Materials Science, Tsukuba, Ibaraki, Japan cLublin University of Technology, Nadbystrzycka 38a, 20-618 Lublin, Poland |
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| The paper deals with the investigations of structural properties of Zn1-xMnxTe films, which were fabricated under various deposition conditions using the thermal evaporation method in a closed volume. The surface morphology of the samples was studied, the phase analysis of their structures was performed, the elemental analysis of the films and the crystal lattice constant were investigated. The texture perfection of the films before and after copper ion implantation was evaluated. |
DOI: 10.12693/APhysPolA.123.939 PACS numbers: 61.05.cp, 61.72.uj |