Study on the Breakdown Mechanism of Fabrication of Micro Channels in Fused Silica Substrates with ps Laser Pulses |
| S.X. Lia, Z.C. Baib and S.J. Qinb
aSchool of Physics and Electronic Science, Guizhou Normal College, China bKey Lab of Photoelectron Technology and Application, University of Guizhou, China |
| Received: November 4, 2011; In final form: September 29, 2012 |
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| A new microchannel fabrication technology for fused silica substrate is presented. A mode-locked laser was used to fabricate straight microchannels in a fused silica substrate by laser plasma-induced plasma. The depth of the channels is up to 5 mm and there are no thermal cracks around the channel. We studied the ionization mechanism of optical breakdown formed by laser pulses and discussed the optical breakdown threshold. A mechanism is proposed to explain the formation of the microchannels and the characteristics of the microchannels are analyzed through the laser pulse characteristics. |
DOI: 10.12693/APhysPolA.123.67 PACS numbers: 52.50.Jm, 52.40.Hf, 61.80.-x, 42.62.-b |