Effects of Thermal Annealing and Film Thickness on the Structural and Morphological Properties of Titanium Dioxide Films |
S. Çörekçía, K. Kızılkayab, T. Asarb, M.K. Öztürkb, M. Çakmakb and S. Özçelíkb
aDepartment of Physics, Kirklareli University, 39160 Kırklareli, Turkey bDepartment of Physics, Gazi University, 06500 Ankara, Turkey |
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Titanium dioxide (TiO2) thin films having different thicknesses of 220, 260, and 300 nm were deposited onto well-cleaned n-type silicon substrates by reactive DC magnetron sputtering and annealed in the range of 200-1000°C in steps of 200°C. The effects of thermal annealing and thickness variation on the crystalline quality and surface morphology of the films were investigated by X-ray diffraction and atomic force microscopy measurements. It was found that the film quality and morphology depend on the annealing temperature. TiO2 films exhibit a grain-like surface morphology. The root-mean-square roughness and grain size on the surface increase as a result of increasing film thickness. |
DOI: 10.12693/APhysPolA.121.247 PACS numbers: 68.55.J-, 61.05.cp, 68.37.Ps |