ACTA

(Zn,Cu)O Films by Atomic Layer Deposition - Structural, Optical and Electric Properties

M.I. Łukasiewicz^a, B.S. Witkowski^a, Ł. Wachnicki^a, K. Kopalko^a, S. Gierałtowska^a, A. Wittlin^a, M. Jaworski^a, E. Guziewicz^a and M. Godlewski^{a, b}
^aInstitute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
^bDept. of Mathematics and Natural Sciences College of Science, Cardinal S. Wyszyński University, Dewajtis 5, 01-815 Warsaw, Poland

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ZnCuO thin films have been deposited on silicon, glass and quartz substrates by atomic layer deposition method, using reactive organic precursors of zinc and copper. As zinc and copper precursors we applied diethylzinc and copper(II) acetyloacetonate. Structural, electrical and optical properties of the obtained ZnCuO layers are discussed based on the results of scanning electron microscopy, energy dispersive spectroscopy, X-ray diffraction, atomic force microscopy, the Hall effect and photoluminescence investigations.

DOI: 10.12693/APhysPolA.120.A-34
PACS numbers: 68.55.Ln, 68.55.Nq, 78.66.Hf, 81.15.Kk