ACTA

Effects of Ar/O₂ Gas Ratio on the Properties of the Zn_0.9Cd_0.1O Films Prepared by DC Reactive Magnetron Sputtering

I. Shtepliuk^a, G. Lashkarev^a, V. Khomyak^b, P. Marianchuk^b, P. Koreniuk^c, D. Myroniuk^a, V. Lazorenko^a and I. Timofeeva^a
^aI. Frantsevich Institute for Problems of Material Science, NASU, 03680, Kiev-142, Ukraine
^bChernivtsi National University, 58012, Chernivtsi, Ukraine
^cInstitute of Physics, NASU, 03028, Kiev, Ukraine

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Zn_0.9Cd_0.1O ternary alloys have been grown on the sapphire substrates by using the direct current (dc) magnetron sputtering. X-ray diffraction measurements showed that all samples were highly oriented films along the c-axis perpendicular to the substrate surface. X-ray diffraction confirmed that the crystal quality of Zn_0.9Cd_0.1O films can be controlled by changing the gas ratio of Ar/O₂. The optical properties of these films have been investigated by means of the optical transmittance and the low-temperature photoluminescence spectra. It was found that the optical band gap of the deposited films can be tuned by growth parameters. The luminescence processes are considered in the terms of alloy fluctuation.

DOI: 10.12693/APhysPolA.120.A-61
PACS numbers: 78.55.Et, 78.67.Bf