SPM Characterization of Titanium Disilicide Nanostructures Grown on a Ni-Modified Si(100) Substrate
W. Koczorowski, M. Bazarnik and R. Czajka
Institute of Physics, Poznań University of Technology, Nieszawska 13A, 60-965 Poznań, Poland
Received: December 13, 2010; In final form: March 15, 2011
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The paper presents our recent investigations of the early stage growth of titanium silicides on a modified Si(100) substrate. The substrate was modified by deposition of a minute amount of Ni atoms, and the subsequent flash annealing. This process led to the creation of parallel defect lines on the Si(100) surface. We expected TiSi2 to form elongated structures on top and/or between the defect lines. Though this idea failed, stable nanostructures were observed and characterized using scanning probe microscopy (scanning tunneling microscopy and atomic force microscopy) methods.
DOI: 10.12693/APhysPolA.120.480
PACS numbers: 68.37.Ef, 68.37.Ps