ACTA

ZnO Thin Films Deposited on Sapphire by High Vacuum High Temperature Sputtering

M.A. Borysiewicz^a, I. Pasternak^a, E. Dynowska^{a, b}, R. Jakieła^b, V. Kolkovski^b, A. Dużyńska^b, E. Kamińska^a and A. Piotrowska^a
^aInstitute of Electron Technology, al. Lotników 32/46, 02-668 Warsaw, Poland
^bInstitute of Physics, PAS, al. Lotników 32/46, 02-668 Warsaw, Poland

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ZnO (0001) layers on sapphire (0001) substrates were fabricated by means of high temperature high vacuum magnetron sputtering. The layers were deposited onto a thin MgO buffer and a low temperature ZnO nucleation layer, which is a technology commonly used in MBE ZnO growth. This paper reports on using this technology in the sputtering regime.

DOI: 10.12693/APhysPolA.119.686
PACS numbers: 81.05.Dz, 81.15.Cd, 61.05.cp, 68.37.Hk, 68.37.Ps, 68.49.Sf, 78.55.Et