Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source |
| A. Bartnik, H. Fiedorowicz, R. Jarocki, J. Kostecki, R. Rakowski, A. Szczurek and M. Szczurek
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland |
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| Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics, giving sufficient fluence for some applications. In this work we present results of investigations concerning applications of a laser plasma EUV source based on a double stream gas puff target. The source was equipped with two different grazing incidence collectors. One of them was a multifoil collector, the second one was an axisymmetrical ellipsoidal collector. The multifoil mirror was used mainly in experiments concerning micromachining of organic polymers by direct photo etching. The experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. The smallest element of a pattern structure obtained in this way was 5 μm, while the structure height was 50 μm giving an aspect ratio about 10. The laser plasma EUV source equipped with the axisymmetrical ellipsoidal collector was used for surface modification of organic polymers and inorganic solids. The surface morphology after irradiation was investigated. Different forms of micro- and nanostructures were obtained depending on material and irradiation conditions. |
| DOI: 10.12693/APhysPolA.117.384 PACS numbers: 52.38.Ph, 82.50.Kx, 81.40.Wx |