Full Field Nanoimprint on Mask Aligners Using Substrate Conformal Imprint Lithography Technique |
| Ran Ji, A. Krüger, M. Hornung
SUSS MicroTec Lithography GmbH, Garching, Germany |
| M. Verschuuren, R. van de Laar and J. van Eekelen
Philips Research, Eindhoven, Netherlands |
| Full Text PDF |
| DOI: 10.12693/APhysPolA.116.S-187 |