Analysis of Interaction of Surfactant Molecules with Si(hkl) Planes on the Basis of Anisotropic Etching in Alkaline Solutions |
| I. Zubel and M. Kramkowska
Faculty of Microsystems Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland |
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| In the paper, measurements of surface tension of solutions used for silicon etching and results of etching in the solutions are presented. Based on the obtained results, the analysis of interactions of surfactants with differently oriented silicon planes has been carried out. |
| DOI: 10.12693/APhysPolA.116.S-105 PACS numbers: 61.30.Hn, 61.72.uj, 64.70.kg |