Multilayered ZnO Films of Improved Quality Deposited by Magnetron Sputtering
A. Ievtushenko a, V. Karpyna a, G. Lashkarev a, V. Lazorenko a, V. Baturin b, A. Karpenko b, M. Lunika b and A. Dan'ko c
a Institute for Problems of Material Science, NASU, 3 Krzhizhanovskogo st., Kiev, 03680, Ukraine
b Institute of Applied Physics, NASU, 58 Petropavlovskaya st., Sumy, 40030, Ukraine
c SSI "Institute for Single Crystals", NASU, 60 Lenin Ave., Kharkov, 61001, Ukraine
Full Text PDF
Received: 7 06 2008;
Multilayered ZnO films were deposited by rf magnetron sputtering on silicon and sapphire substrates. The aim of this work is to improve structural quality of ZnO thin films grown on just listed substrates. Presented X-ray diffraction data testify to remarkable relaxation of compressive stress in two- and three-layered ZnO films in comparison with single-layer one.
DOI: 10.12693/APhysPolA.114.1131
PACS numbers: 81.05.Dz, 81.15.Cd, 61.05.cp,