Deposition of Amorphous Hydrogenated Carbon Coatings by Plasma Jet
L. Marcinauskas a,b, A. Grigonis b, H. Manikowski c and V. Valincius a
a Lithuanian Energy Institute, Breslaujos st. 3, LT-44403, Kaunas, Lithuania
b Kaunas University of Technology, Physics Department, Studentu st. 50, LT-51368, Kaunas, Lithuania
c PoznańUniversity of Technology, Institute of Physics, Piotrowo 3, PL-60-965, Poznań, Poland
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Received: 26 08 2007;
In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an Ar-C2H2 and Ar-C2H2-H2 gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the Ar:C2H2 ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled.
DOI: 10.12693/APhysPolA.113.1063
PACS numbers: 81.15.-z, 81.05.Uw, 78.30.-j