Non-Destructive Material Homogeneity Evaluation Using Scanning Millimeter Wave Microscopy |
| A. Laurinavičius a, T. Anbinderis b, J. Ikonikova b and Yu. Prishutov b
a Semiconductor Physics Institute, A. Goštauto 11, 01108 Vilnius, Lithuania b JSC "ELMIKA", Naugarduko 41, 03227 Vilnius, Lithuania |
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| Received: 26 08 2007; |
| Millimeter wave bridge technique for non-destructive material homogeneity characterization is described. The idea of this technique is the local excitation of the millimeter waves in the testing material and the measurement of the transmitted (reflected) wave amplitude and phase in different places of it, i.e. the material plate is scanned by the beam of the millimeter waves. The results of the homogeneity measurements for dielectric wafers according to dielectric constant anisotropy are presented. The measurement technique sensitivity is discussed. |
| DOI: 10.12693/APhysPolA.113.1051 PACS numbers: 78.70.Gq, 81.70.Ex |