Influence of Thickness and Magnetic Field on Magnetic Ordering Temperatures in Holmium Thin Films

J. Dudáv a, M. Guzan a, S. Gabáni b, V. Kavečanský b, I. Gošciańska c, A. Vincze d and M. Konč e a Dep. of Theoretical Electrotechnics and Electrical Measurement, Technical University, Park Komenského 3, 043 89 Košice, Slovakia b Institue of Experimental Physics, Slovak Academy of Sciences, 043 53 Košice, Slovakia c Institute of Physics, A. Mickiewicz University, Umultowska 85, 61-614 Poznań, Poland d International Laser Centre, Ilkovičova 3, 812 19 Bratislava, Slovakia e Institute of Physics, P.J. Šafárik University, Park Angelinum, 041 54 Košice, Slovakia

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Received: 9 07 2007;

Influence of thickness and magnetic field on magnetic ordering temperatures is reported. The X-ray diffraction of Ho films confirmed their preferential crystal orientation and revealed diffraction peaks originating from the hcp structure of Ho and those from inessential holmium dihydride content. Secondary ion mass spectroscopy showed a very homogeneous distribution of holmium in thin films. Electrical resistance measurements on Ho films in the thickness range from 98 nm to 215 nm showed a "knee-like" resistance anomaly near the TN. The TN value of these films decreased with decreasing film thickness. Magnetic field applied parallel to the thin film plane caused an increasing suppression of the TN value up to 5 K with increasing flux density value up to 5 T.

DOI: 10.12693/APhysPolA.113.191 PACS numbers: 73.61.At, 75.70.Ak, 68.55.Nq