The Surface Hydro-Oxidation of LaNiO3-x Thin Films
S. Mickevičius a, S. Grebinskij a, V. Bondarenka a, V. Lisauskas a, K. Šliužienė a, H. Tvardauskas a, B. Vengalis a, B.A. Orłowski b, V. Osinniy b and W. Drube c
a Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania
b Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland
c Hamburger Synchrotronstrahlungslabor HASYLAB, am Deutschen Elektronen-Synchrotron DESY, Notkestr. 85, 22603 Hamburg, Germany
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Received: 03 07 2007;
The high-energy X-ray photoelectron spectroscopy was used to determine the composition and chemical structure of epitaxial LaNiO3-x films obtained by a reactive dc magnetron sputtering. It was found that the oxide and hydroxide species of La and Ni are on the films surface. The thickness of hydroxide enriched layer, estimated from the oxide and hydroxide peak intensities, is about 2 nm.
DOI: 10.12693/APhysPolA.112.113
PACS numbers: 79.60.-i, 71.20.Nr, 29.20.Lq