Positron Implantation Profile in Kapton
J. Dryzeka,b and E. Dryzeka
aInstitute of Nuclear Physics, Radzikowskiego 152, 31-342 Kraków, Poland
bInstitute of Physics, University of Zielona Góra, Prof. Szafrana 4a, 65-516 Zielona Góra, Poland
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Received: 5 06 2006;
The discussion presented in the paper focuses on processes accompanying positron implantation in condensed matter. They finally constitute the positron implantation profile which generally does not exhibit the exponential behavior as it is concluded from the Monte Carlo simulation made using the EGSnrc 4.0 code. The simulation was performed for the kapton and two commonly used positron sources 22Na and 68Ge\68Ga. New formula for the implantation profile was proposed.
DOI: 10.12693/APhysPolA.110.577
PACS numbers: 78.70.-g