Diffusion of Palladium on Tantalum Microcrystal
G. Antczak and R. Błaszczyszyn
Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland
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Received: July 5, 2002
Surface diffusion of palladium, Θ=2 ML, on a tantalum microcrystal was studied by means of field electron emission microscopy within the temperature range 665--790 K. The observed sharp moving boundary-diffusion proceeds with an activation energy ranging from 1.25 to 1.7 eV/atom, depending on the crystallographic direction.
DOI: 10.12693/APhysPolA.103.57
PACS numbers: 79.70.+q, 68.37.Vj, 68.43.Jk, 05.40.Ca