Electron Microscopy and X-ray Diffraction Study of AlN Layers
A. Kowalczyka, A. Jagodaa, A. Mücklichb, W. Matzb, M. Pawłowskaa, R. Ratajczakc and A. Turosa,c
aInstitute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warsaw, Poland
bForschungszentrum Rossendorf, IIM, POB 510119, 01314 Dresden, Germany
cSoltan Institute for Nuclear Studies, Hoża 69, 00-681 Warsaw, Poland
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AlN nanocrystalline layers and superstructures are used in the modern optoelectronic technology as reflecting mirrors in semiconductor lasers. In the present work the properties of AlN films prepared by sputtering methods from an AlN target in reactive Ar + N plasma were investigated. The characterisation was performed with HRTEM, SEM, glancing angle XRD and RBS methods. The present measurements confirmed the polycrystalline structure of AlN layers and enabled the evaluation of their grain size. The roughness and thickness of the layers were additionally determined by ellipsometric and profilometric measurements.
DOI: 10.12693/APhysPolA.102.221
PACS numbers: 52.77.Dq